Example
Bottleneck unlock
Fab Tool Capacity
Wafer starts move through lithography, etch/deposition, metrology, and probe/test. Each stage has its own capacity, yield loss, cost, and carbon load, so the best next move depends on the active tool limit.
Decision logic
Identify which fab tool family governs qualified wafer output and what constraint becomes binding after the first unlock.
Decision question
Which tool bottleneck unlocks the most qualified wafer output this month?
Model output
Best first unlock+1 lithography shift
Current good output~9.3k wafers/month
Next limitMetrology becomes binding
Active limits
- Lithography fully loaded
- Metrology near limit
Key insight
Lithography is the first wall; once scanner capacity opens, metrology becomes the next governing limit rather than budget.
Adding budget alone does not raise qualified wafers while scanner capacity is fixed.
A lithography shift opens immediate output, then inspection capacity starts to matter.
The next capital request should be sequenced from scanner relief to metrology coverage.